Hyeon-Dong Shin

Title: Hyeon-Dong Shin: Innovator in Plasma Technology

Introduction

Hyeon-Dong Shin is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma technology, particularly through his innovative designs and patents. His work is recognized for its potential applications in various industries.

Latest Patents

Hyeon-Dong Shin holds a patent for a "Plasma generating apparatus having antenna with impedance controller." This apparatus includes a vacuum chamber, an ElectroStatic Chuck (ESC), and an antenna holder. The vacuum chamber is designed with a hollow interior and is sealed at its top by a vacuum plate that features a central through-hole. The ESC is positioned at the internal center of the vacuum chamber, while the antenna unit is located within the chamber beneath the vacuum plate. The antenna cover is coupled to the top of the antenna unit, receiving and forwarding an external source RF to the antenna unit. The cover holder is secured by the upper surface of the vacuum plate, effectively suspending and holding the antenna unit.

Career Highlights

Hyeon-Dong Shin is currently employed at Jehara Corporation, where he continues to develop innovative technologies. His work at the company has been instrumental in advancing plasma generation techniques, which are crucial for various applications in electronics and materials processing.

Collaborations

Hyeon-Dong Shin collaborates with fellow inventor Hong-Seub Kim, contributing to the development of cutting-edge technologies in their field.

Conclusion

Hyeon-Dong Shin's contributions to plasma technology through his patent and work at Jehara Corporation highlight his role as an influential inventor. His innovative designs continue to pave the way for advancements in the industry.