This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Jusung Engineering Co., Ltd., Jusung Engineering Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hyeon Chang Kim: Innovator in Gas Supply Methods
Introduction
Hyeon Chang Kim is a notable inventor based in Gwangju, South Korea. He has made significant contributions to the field of gas supply methods, holding a total of 2 patents. His innovative approaches have enhanced the efficiency and uniformity of substrate processing.
Latest Patents
One of his latest patents is a gas supplying method using a gas distributing unit. This method includes a plurality of gas flow rate control devices installed on various gas supplying channels. It is designed to individually control the flow rates of process gases supplied through these channels, allowing for different adjustments in gas supply times and orders. This innovation improves the uniformity in thickness of the deposited thin film across the entire surface area of the substrate.
Another significant patent is related to a substrate processing device. This device comprises a chamber, a chamber lid that supports the upper portion of the chamber, and a susceptor that faces the chamber lid and supports a substrate. It also includes a gas ejection unit that ejects multiple gases and an anti-sag bolt installed in the chamber lid, which can be combined with the gas injection unit. The anti-sag bolt features several flow paths for the gases to flow through.
Career Highlights
Hyeon Chang Kim has worked with Jusung Engineering Co., Ltd., where he has applied his expertise in gas supply methods and substrate processing technologies. His work has contributed to advancements in the industry, showcasing his commitment to innovation.
Collaborations
Some of his notable coworkers include Kwang Su Yoo and Dae Soo Jang. Their collaborative efforts have likely played a role in the development of his patented technologies.
Conclusion
Hyeon Chang Kim is a distinguished inventor whose work in gas supply methods and substrate processing devices has made a significant impact in his field. His patents reflect a dedication to improving technology and efficiency in substrate processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile