Gyeongsangbuk-do, South Korea

Hyeok Yun

This inventor holds 1 USPTO granted patent. Top assignees: Pohang University of Science and Technology Foundation, Yeungnam University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hyeok Yun. Retrieved from https://idiyas.com/inventor/hyeok-yun-id345l8s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hyeok Yun: Innovator in Semiconductor Manufacturing

Introduction

Hyeok Yun is a notable inventor based in Gyeongsangbuk-do, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods and technologies.

Latest Patents

Hyeok Yun holds a patent for a "Method for setting of semiconductor manufacturing parameter and computing device for executing the method." This invention involves a method performed in a computing device that includes one or more processors and a memory for storing programs executed by the processors. The method encompasses inputting manufacturing parameters for semiconductor production into a neural network model and training the model to predict power and delay based on these parameters. He has 1 patent to his name.

Career Highlights

Throughout his career, Hyeok Yun has worked with prestigious institutions such as Yeungnam University and the Pohang University of Science and Technology Foundation. His work has been instrumental in advancing semiconductor technologies and methodologies.

Collaborations

Hyeok Yun has collaborated with various professionals in his field, including Hyun Chul Choi, who is a prominent figure in semiconductor research.

Conclusion

Hyeok Yun's contributions to semiconductor manufacturing highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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