Yongin, South Korea

Hye Young Heo

This inventor holds 1 USPTO granted patent. Top assignee: Enpulse Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hye Young Heo. Retrieved from https://idiyas.com/inventor/hye-young-heo-4qrsa3ad

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hye Young Heo: Innovator in Polishing Technology

Introduction

Hye Young Heo is a notable inventor based in Yongin-si, South Korea. She has made significant contributions to the field of polishing technology, particularly through her innovative designs and methods. Her work has garnered attention for its practical applications in various industries.

Latest Patents

Hye Young Heo holds a patent for a polishing pad, along with a method for manufacturing the polishing pad and a polishing method that applies the polishing pad. The patent describes a polishing pad that includes a polyurethane, which features a silane repeating unit in its main chain. This innovative design results in a reduction of defects on a substrate after polishing with the pad and a fumed silica slurry to about 40 or less. This advancement is crucial for improving the quality of polished surfaces in various applications.

Career Highlights

Hye Young Heo is associated with Enpulse Co., Ltd., where she continues to develop and refine her inventions. Her work at the company has positioned her as a key player in the polishing technology sector. With her expertise, she has contributed to enhancing the efficiency and effectiveness of polishing processes.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Hye Young Heo's innovative contributions to polishing technology exemplify her dedication to advancing the field. Her patent for a specialized polishing pad showcases her ability to address industry needs effectively. Her work continues to influence the standards of quality in polishing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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