Suwon, South Korea

Hye Lyn Kim

This inventor holds 2 USPTO granted patents. Top assignee: Hydis Technologies Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hye Lyn Kim. Retrieved from https://idiyas.com/inventor/hye-lyn-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: Hye Lyn Kim: Innovator in Display Technology

Introduction

Hye Lyn Kim is a prominent inventor based in Suwon-si, South Korea. She has made significant contributions to the field of display technology, holding 2 patents that showcase her innovative approach to enhancing display apparatus.

Latest Patents

Her latest patents include a display apparatus and a method of forming post spacers in a display apparatus. The method involves applying a resin layer on an upper portion of the upper substrate or the lower substrate. It also includes arranging a plurality of through-hole forming bodies on the resin layer, applying another resin layer, exposing it to light using a mask, and removing areas not designated for post spacers. The resulting display apparatus features a plurality of post spacers positioned between the upper and lower substrates, with some spacers equipped with through-holes.

Career Highlights

Hye Lyn Kim is currently associated with Hydis Technologies Co., Ltd., where she continues to push the boundaries of display technology. Her work has been instrumental in developing advanced methods that improve the functionality and efficiency of display devices.

Conclusion

Hye Lyn Kim's contributions to display technology through her innovative patents highlight her role as a leading inventor in her field. Her work not only advances technology but also sets a foundation for future innovations in display systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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