Gumi, South Korea

Hye In Bang

This inventor holds 1 USPTO granted patent. Top assignee: Kolon Glotech, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hye In Bang. Retrieved from https://idiyas.com/inventor/hye-in-bang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hye In Bang: Innovator in Artificial Turf Technology

Introduction

Hye In Bang is a notable inventor based in Gumi, South Korea. He has made significant contributions to the field of artificial turf technology. His innovative approach has led to the development of a unique artificial turf structure that enhances performance and durability.

Latest Patents

Hye In Bang holds a patent for an "Artificial turf structure having improved buffering performance." This invention features a protective layer, a buffer layer with a three-dimensional structure, a bubble layer, a pile unit, and a backing layer. The design aims to improve the overall performance of artificial turf, making it more resilient and effective for various applications.

Career Highlights

Hye In Bang is currently employed at Kolon Glotech, Inc., where he continues to work on advancements in artificial turf technology. His dedication to innovation has positioned him as a key figure in his field. With 1 patent to his name, he exemplifies the spirit of creativity and problem-solving in engineering.

Collaborations

Hye In Bang collaborates with talented coworkers, including Ki Tae Bae and Se Jun Hwang. Their combined expertise fosters a dynamic environment for innovation and development within their projects.

Conclusion

Hye In Bang's contributions to artificial turf technology highlight his role as an inventor dedicated to improving performance and functionality. His work at Kolon Glotech, Inc. and his innovative patent reflect his commitment to advancing the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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