Hwanchul Jeon

Title: Hwanchul Jeon: Innovator in Lithography Technology

Introduction

Hwanchul Jeon is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of lithography technology, particularly in the development of pellicles for extreme ultraviolet (EUV) lithography. With a total of 3 patents to his name, Jeon's work is recognized for its innovative approach to mitigating thermal accumulation in lithography processes.

Latest Patents

One of Jeon's latest patents focuses on a pellicle designed to prevent thermal accumulation in lithography processes, including extreme ultraviolet lithography. This pellicle features a membrane and at least one thermal buffer layer on its surface. The thermal buffer layer is engineered to have a greater emissivity than the membrane itself, which helps in managing heat more effectively. Additionally, the carbon content of the thermal buffer layer is higher than that of the membrane, enhancing its thermal properties. The design allows for multiple thermal buffer layers on separate surfaces, each potentially possessing different properties. A capping layer made from hydrogen-resistant material may also be included, further improving the pellicle's performance.

Career Highlights

Throughout his career, Hwanchul Jeon has worked with notable organizations such as Samsung Electronics and Sungkyunkwan University. His experience in these institutions has allowed him to collaborate on various innovative projects, contributing to advancements in lithography technology.

Collaborations

Some of Jeon's coworkers include Munja Kim and Sungwon Kwon. Their collaborative efforts have played a crucial role in the development of his patented technologies.

Conclusion

Hwanchul Jeon stands out as a key figure in the field of lithography, with his innovative patents addressing critical challenges in the industry. His work continues to influence advancements in lithography technology, showcasing the importance of innovation in this field.