Samsung Electronics Co., Ltd.

Sungkyunkwan University

Hwanchul Jeon

Munja Kim

Byunggook Kim

Jaehyuck Choi

Yongseok Jung

Roman Chalykh

Sungwon Kwon

Taesung Kim

Seul-Gi Kim

Ji-Beom Yoo

Dong-Wook Shin

Sooyoung Kim

A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.

Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same

The method includes forming a graphite layer on a substrate, forming a supporting layer on the graphite layer to form a stack of the graphite layer and the supporting layer, removing the substrate to separate the stack from the substrate, transferring the stack of the graphite layer and the supporting layer onto a frame, and removing the supporting layer from the frame.

Methods of fabricating pellicles using supporting layer

Growing community of inventors

Seoul, South Korea

Hwanchul Jeon