Daejeon, South Korea

Hwan-Pyoung Lee

This inventor holds 1 USPTO granted patent. Top assignee: Ram Technology LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hwan-Pyoung Lee. Retrieved from https://idiyas.com/inventor/hwan-pyoung-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hwan-Pyoung Lee: Innovator in Hydrogen Fluoride Purification

Introduction: Hwan-Pyoung Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of chemical engineering, particularly in the purification of hydrogen fluoride. His innovative approach has led to advancements in the efficiency and effectiveness of purification processes.

Latest Patents: Hwan-Pyoung Lee holds a patent for a "Method and apparatus for purifying ultra-high purity hydrogen fluoride." This invention discloses a method that utilizes a continuous distillation process. By introducing crude hydrogen fluoride into a multi-stage distillation column, impurities are effectively removed through contact with fluorine gas. The concentration of the fluorine gas is automatically controlled based on the content of arsenic fluoride, which is a known impurity.

Career Highlights: Hwan-Pyoung Lee is currently associated with Ram Technology LLC, where he continues to work on innovative solutions in chemical purification. His expertise in the field has positioned him as a valuable asset to his company and the industry at large.

Collaborations: Hwan-Pyoung Lee collaborates with talented individuals such as June-Ing Kil and Young-Su Jang. Their combined efforts contribute to the advancement of technology in their field.

Conclusion: Hwan-Pyoung Lee's work in the purification of hydrogen fluoride showcases his innovative spirit and dedication to improving chemical processes. His contributions are significant in the realm of chemical engineering, and his patent reflects a commitment to advancing technology for better industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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