Company Filing History:
Years Active: 1998
Title: Hutoshi Shimai: Innovator in Photoresist Technology
Introduction
Hutoshi Shimai is a notable inventor based in Fujisawa, Japan. He has made significant contributions to the field of photoresist technology, particularly in the area of substrate treatment prior to exposure.
Latest Patents
Hutoshi Shimai holds a patent for a method for the pre-treatment of a photoresist layer on a substrate. This invention proposes an improved technique for treating a photoresist layer formed on a substrate surface before it undergoes pattern-wise exposure to actinic rays. The method addresses the issue of extraneous portions of the resist layer that are formed by overspreading the photoresist solution. These extraneous portions can be effectively dissolved away using a cleaning solution that differs from conventional methods. Instead of relying solely on organic solvents, his method utilizes an aqueous alkaline solution containing a water-soluble alkaline compound. This solution may also include a limited amount of water-miscible organic solvents and optionally an anti-corrosion agent.
Career Highlights
Hutoshi Shimai is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work has contributed to the development of more efficient and effective methods in photoresist application.
Collaborations
Hutoshi has collaborated with notable colleagues such as Mitsuru Sato and Naomi Nagatsuka, enhancing the innovation process through teamwork and shared expertise.
Conclusion
Hutoshi Shimai's contributions to photoresist technology exemplify the importance of innovation in the semiconductor industry. His patented method represents a significant advancement in the treatment of photoresist layers, showcasing his role as a key inventor in this field.