San Jose, CA, United States of America

Hunkee Cho

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hunkee Cho. Retrieved from https://idiyas.com/inventor/hunkee-cho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hunkee Cho

Introduction

Hunkee Cho is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of semiconductor processing. His innovative work focuses on the characterization of plasmas, which are crucial in various semiconductor manufacturing processes.

Latest Patents

Hunkee Cho holds a patent titled "Model-based characterization of plasmas in semiconductor processing systems." This patent describes a method for characterizing plasmas during semiconductor processes. The method involves receiving operating conditions for a semiconductor process that generates plasma inside a chamber. It also includes providing these operating conditions as inputs to a trained model, which characterizes the plasma in the chamber based on the given conditions. This innovative approach enhances the understanding and control of plasma behavior in semiconductor manufacturing.

Career Highlights

Hunkee Cho is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to apply his expertise in plasma characterization to improve semiconductor processing technologies. His contributions have been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

Hunkee Cho's innovative work in plasma characterization has made a significant impact on semiconductor processing. His patent and contributions at Applied Materials, Inc. highlight his role as a key figure in advancing technology in this critical industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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