Hungwen Li

Title: Innovations of Inventor Hungwen Li

Introduction

Hungwen Li is a prominent inventor based in Cupertino, CA (US). He has made significant contributions to the field of technology, particularly in security systems for network-connected devices. With a total of 3 patents to his name, his work focuses on enhancing the security and efficiency of trusted execution environments.

Latest Patents

Hungwen Li's latest patents include innovative systems designed to perform secure operations. One of his notable inventions is a system that incorporates an I/O subsystem, a memory subsystem, and processors. This system is capable of executing processes in both trusted execution environments (TEEs) and rich execution environments (REEs). Each TEE and REE is identified by a corresponding access identifier (AID) and is protected by a system resource protection unit (SRPU). The SRPU includes instructions that control access to the TEE using a data structure with allowed AIDs and pointers to accessible memory locations.

Another significant patent involves a method of generating multiple identifications with multi-level security for network-connected devices. This invention allows a network-connected device to be identified by multiple keys corresponding to various security levels. The device can detect requests from the network and determine the appropriate security level to establish a secure communication session.

Career Highlights

Hungwen Li is currently employed at MediaTek Corporation, where he continues to innovate and develop advanced security solutions. His work has positioned him as a key player in the technology sector, particularly in the realm of secure computing.

Collaborations

He collaborates with talented coworkers, including Yu-Tien Chang and Chih-Pin Su, who contribute to the development of cutting-edge technologies in their field.

Conclusion

Hungwen Li's contributions to technology through his patents reflect his commitment to enhancing security in network-connected devices. His innovative approaches continue to influence the industry and pave the way for future advancements.