Company Filing History:
Years Active: 2022-2025
Title: Innovations of Inventor Hungbae Ahn
Introduction
Hungbae Ahn is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor device manufacturing. With a total of 4 patents to his name, Ahn's work focuses on enhancing the efficiency and accuracy of pattern layout designs.
Latest Patents
Among his latest patents is a method for designing pattern layouts that include oblique edges. This innovative approach involves performing optical proximity correction (OPC) for a mask layout, resulting in a corrected layout. The process includes creating a first corrected layout through grid snapping for an oblique edge and subsequently performing OPC for this layout to create a second corrected layout. Another significant patent is related to the manufacturing of a photomask set for forming patterns. This method entails preparing a mask layout with multiple first layout patterns and grouping pairs of these patterns to optimize the photomask set.
Career Highlights
Hungbae Ahn is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge innovations in semiconductor technology. Ahn's expertise in optical proximity correction and photomask manufacturing has positioned him as a valuable asset in his field.
Collaborations
Ahn has collaborated with notable coworkers, including Sangoh Park and Sunggon Jung. Their combined efforts have led to advancements in semiconductor manufacturing processes and have furthered the development of innovative technologies.
Conclusion
Hungbae Ahn's contributions to the field of semiconductor device manufacturing are noteworthy. His innovative patents and work at Samsung Electronics Co., Ltd. highlight his role as a leading inventor in the industry. Ahn's dedication to enhancing pattern layout designs continues to influence the future of semiconductor technology.