Hung-Yang Chen

Title: Innovations of Inventor Hung-Yang Chen

Introduction

Hung-Yang Chen is a notable inventor based in Somerset, NJ (US). He has made significant contributions to the field of photoresist compositions, holding a total of 3 patents. His work focuses on developing advanced materials that enhance the manufacturing processes in the semiconductor industry.

Latest Patents

One of his latest patents is titled "PAG-free positive chemically amplified resist composition and methods of using the same." This invention features a resist composition that includes a phenolic resin component, a photoactive 2,1,5-diazonaphthoquinonesulfonate component (PAC), and a solvent component, all without a photo acid generator (PAG). The composition is designed to be used in both thick and thin film photoresist device manufacturing methodologies. Another significant patent is the "Novolak/DNQ based, chemically amplified photoresist." This invention relates to resist compositions that comprise a polymer component, a photoacid generator component, a photoactive diazonaphthoquinone component, and a base component, among others. The methods of using these compositions are also detailed, emphasizing their application in photoresist device manufacturing.

Career Highlights

Hung-Yang Chen has worked with various companies throughout his career, including Merck Patent GmbH. His experience in the industry has allowed him to develop innovative solutions that address the challenges faced in semiconductor manufacturing.

Collaborations

He has collaborated with notable professionals in the field, including Takanori Kudo and Medhat A Toukhy. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Hung-Yang Chen's contributions to the field of photoresist compositions demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a deep understanding of materials science and their applications in the semiconductor industry.