HSINCHU, Taiwan

Hung-ting Lin


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Hung-ting Lin and His Contributions to PVD Technology

Introduction

Hung-ting Lin is a notable inventor hailing from Hsinchu, Taiwan, recognized for his innovative contributions to the field of physical vapor deposition (PVD). With a single patent to his name, Lin demonstrates a focus on enhancing the efficiency and effectiveness of deposition processes critical in semiconductor manufacturing.

Latest Patents

Hung-ting Lin is credited with the patent for an "Apparatus for Physical Vapor Deposition and Method for Forming a Layer". This inventive apparatus comprises a chamber designed for vapor deposition, which includes a pedestal that accommodates a wafer alongside a specialized ring. The ring features a complex barrier structure, thoughtfully designed to optimize the deposition process. The innovation lies in its ability to control the vertical distances between different portions of the ring, thereby enhancing the overall performance of the deposition apparatus.

Career Highlights

Lin's career is marked by his role at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading entity in the semiconductor industry. His work contributes significantly to TSMC's reputation for groundbreaking advancements in chip manufacturing technologies. The patent achieved during his tenure showcases his expertise and dedication to innovation in this vital field.

Collaborations

Throughout his career, Hung-ting Lin has collaborated with other talented professionals, such as Wen-Chih Wang. This teamwork fosters an environment of shared ideas and innovative solutions, which is essential in a fast-paced technological landscape. Collaborators like Wang contribute to the rich tapestry of innovation that defines TSMC's achievements.

Conclusion

As an inventor, Hung-ting Lin stands out for his contributions to the PVD technology space. His single but impactful patent reflects his commitment to excellence and innovation within semiconductor manufacturing. As he continues his work at TSMC, the industry looks forward to the advancements that may arise from his future endeavors.

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