Company Filing History:
Years Active: 2023-2024
Title: Innovations of Inventor Hung-Tai Chang
Introduction
Hung-Tai Chang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, his work continues to influence advancements in the industry.
Latest Patents
One of Hung-Tai Chang's latest patents is focused on a semiconductor device and methods of forming it. In this embodiment, the device includes a first fin extending from a substrate, along with a first gate stack over and alongside the sidewalls of the fin. Additionally, it features a first gate spacer along a sidewall of the gate stack and a first source/drain region in the fin adjacent to the gate spacer. This source/drain region includes a first epitaxial layer with a specific dopant concentration of boron. Furthermore, a second epitaxial layer is placed on the first, with a higher dopant concentration of boron.
Another notable patent involves the method of forming a multi-layer epitaxial source/drain region with varying concentrations of boron and germanium. This embodiment also includes a first fin extending from a substrate, a first gate stack, and a first gate spacer. The first epitaxial source/drain region is characterized by an outer surface with more than eight facets in a plane orthogonal to the substrate's top surface.
Career Highlights
Hung-Tai Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor technologies. His work has been instrumental in developing advanced semiconductor devices that enhance performance and efficiency.
Collaborations
Throughout his career, Hung-Tai Chang has collaborated with notable colleagues, including Han-Yu Tang and Ming-Hua Yu. These collaborations have contributed to the successful development of various semiconductor technologies.
Conclusion
Hung-Tai Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to pave the way for future innovations in the industry.