Hung Sheng Wang

Title: Innovations by Hung Sheng Wang

Introduction

Hung Sheng Wang is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative ideas have led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Hung Sheng Wang holds a patent for a substrate processing apparatus. This inventive concept relates to an apparatus designed for processing a substrate. The substrate processing apparatus includes a scatter that is positioned over a baffle, effectively separating plasma and impurities. The scatter features a plate with a first opening located in the central area when viewed from above. Additionally, a collision block is situated over the first opening, facing it, and collides with plasma supplied from a plasma generation unit along with impurities.

Career Highlights

Hung Sheng Wang is currently associated with Psk Inc., where he continues to innovate and develop advanced technologies. His work has been instrumental in improving substrate processing methods, which are crucial in various industrial applications.

Collaborations

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Conclusion

Hung Sheng Wang's contributions to substrate processing technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to advancing the field and improving industrial processes.