The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Oct. 09, 2019
Applicant:
Psk Inc., Hwaseong-si, KR;
Inventor:
Hung Sheng Wang, Hwaseong-si, KR;
Assignee:
PSK INC., Hwaseong-si, KR;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32871 (2013.01); C23C 16/4401 (2013.01); C23C 16/4402 (2013.01); H01J 37/32715 (2013.01); H01J 37/32834 (2013.01); H01L 21/67069 (2013.01); H01J 2237/022 (2013.01); H01J 2237/334 (2013.01);
Abstract
The inventive concept relates to an apparatus for processing a substrate. The substrate processing apparatus includes a scatter that is disposed over a baffle and that separates plasma and impurities. The scatter includes a plate having a first opening formed in a central area thereof when viewed from above and a collision block that is disposed over the first opening to face the first opening and that collides with plasma supplied from a plasma generation unit and impurities.