Suwon, South Korea

Hun Jung

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hun Jung. Retrieved from https://idiyas.com/inventor/hun-jung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovations of Inventor Hun Jung

Introduction

Hun Jung is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of technology, particularly in the development of photosensitive materials. His work is characterized by a focus on enhancing the performance and durability of photosensitive bodies.

Latest Patents

Hun Jung holds a patent for a photosensitive body that includes a protective layer formed on a photosensitive layer. This innovative design incorporates a urethane oligomer acrylate and a modified perfluoropolyether acrylate in the protective layer. This advancement aims to improve the functionality and longevity of photosensitive devices.

Career Highlights

Hun Jung is currently employed at Hewlett-Packard Development Company, L.P., where he continues to push the boundaries of technology through his research and development efforts. His work has garnered attention for its potential applications in various industries.

Collaborations

Some of his notable coworkers include Young-soo Ha and Sung-hoon Kang, who have collaborated with him on various projects, contributing to the innovative environment at Hewlett-Packard.

Conclusion

Hun Jung's contributions to the field of photosensitive materials exemplify the spirit of innovation. His patent reflects a commitment to advancing technology and improving product performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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