Shanghai, China

Huijin Li

This inventor holds 2 USPTO granted patents, plus 1 CIPO patent and 1 EPO patent. Top assignee: 3M Innovative Properties Company. Active years: 2014-2016.


% Patents Active = 100.0


 

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2014-2016

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2 patents (USPTO):Explore Patents

Title: Huijin Li: Innovator in Retroreflective Technology

Introduction

Huijin Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of retroreflective technology, holding a total of 2 patents. His innovative work has garnered attention in various industries, particularly in applications requiring enhanced visibility and safety.

Latest Patents

Huijin Li's latest patents include an exposed lens retroreflective article. This invention features a binder layer, a layer of spaced apart optical elements that are partially embedded in the binder layer, a penetrated colored layer located between the spaced apart optical elements, and a reflective layer that is functionally behind the layer of optical elements and the penetrated colored layer. This design aims to improve the efficiency and effectiveness of retroreflective materials.

Career Highlights

Huijin Li is associated with 3M Innovative Properties Company, where he continues to develop cutting-edge technologies. His work at 3M has positioned him as a key player in the advancement of retroreflective products, contributing to the company's reputation for innovation and quality.

Collaborations

Throughout his career, Huijin Li has collaborated with notable colleagues, including Ningyong Huang and Shane M Klundt. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Huijin Li's contributions to retroreflective technology exemplify the spirit of innovation. His patents and collaborations reflect a commitment to enhancing safety and visibility in various applications. His work continues to inspire future advancements in the field.

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