Hefei, China

HuiDong Zhuang

This inventor holds 1 USPTO granted patent. Top assignee: Chinese Academy of Sciences. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: HuiDong Zhuang. Retrieved from https://idiyas.com/inventor/huidong-zhuang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of HuiDong Zhuang in Plasma Control Technology.

Introduction

HuiDong Zhuang is a notable inventor based in Hefei, China. He has made significant contributions to the field of plasma control technology. His innovative approach focuses on enhancing the efficiency of plasma processes through advanced methods.

Latest Patents

HuiDong Zhuang holds a patent titled "Method for controlling plasma edge fuel particle backflow by powder feedback injection." This patent describes a method that involves measuring a real-time Da value using a visible spectrum diagnostic system. The process includes filtering the measured Da value through a low-pass filter and setting a target Da value. When the actual Da value exceeds the target, an output control voltage signal is calculated. This voltage ultimately determines the lithium powder injection flow rate. The system converts the voltage signal into a sine wave signal, which is then used to inject lithium powder into the fusion device. The injected lithium powder effectively reduces the backflow of fuel particles generated by the interaction between plasma and the wall.

Career Highlights

HuiDong Zhuang is affiliated with the Chinese Academy of Sciences, where he conducts research and development in plasma technology. His work has been instrumental in advancing the understanding and control of plasma processes.

Collaborations

HuiDong has collaborated with esteemed colleagues such as Jiansheng Hu and Guizhong Zuo. Their combined expertise has contributed to the success of various projects in the field.

Conclusion

HuiDong Zhuang's innovative methods in plasma control technology demonstrate his commitment to advancing scientific research. His contributions are paving the way for more efficient plasma processes in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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