Company Filing History:
Years Active: 2011-2012
Title: Innovations of Hui Pan in Zinc Oxide Film Growth
Introduction
Hui Pan is an accomplished inventor based in Singapore, known for her significant contributions to the field of materials science. She has been instrumental in developing innovative methods for growing high-quality zinc oxide films, which have important applications in electronic and optoelectronic devices. With a total of two patents to her name, her work continues to influence advancements in technology.
Latest Patents
Hui Pan's latest patents focus on a method of zinc oxide film grown on an epitaxial lateral overgrowth gallium nitride template. This growth method involves several key steps: first, a gallium nitride layer is grown on a sapphire substrate at approximately 1000°C. Next, a SiO mask is patterned into stripes oriented in the gallium nitride <100> or <110> direction. The process continues with the growth of epitaxial lateral overgrowth (ELO) gallium nitride layers, where facet planes are controlled by selecting the appropriate growth temperature and reactor. Finally, zinc oxide films are deposited on the facets of the ELO gallium nitride templates using chemical vapor deposition (CVD). This innovative method allows for the growth of high-quality zinc oxide crystals with a reduced number of crystal defects, achieving a low dislocation density of less than 10/cm. Such advancements are poised to play a crucial role in the development of future electronic and optoelectronic devices.
Career Highlights
Hui Pan is affiliated with the National University of Singapore, where she conducts her research and development work. Her expertise in materials science and engineering has led to significant breakthroughs in the field, particularly in the growth of zinc oxide films.
Collaborations
Hui Pan has collaborated with notable colleagues, including Hailong Zhou and Jianyi Lin, who have contributed to her research endeavors. Their combined efforts have furthered the understanding and application of zinc oxide films in various technological domains.
Conclusion
Hui Pan's innovative work in the growth of zinc oxide films represents a significant advancement in materials science. Her contributions are expected to have lasting impacts on the development of electronic and optoelectronic devices.