Zhongli, Taiwan

Hui-Chuan Lu

This inventor holds 1 USPTO granted patent. Top assignee: Chunghwa Picture Tubes, Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hui-Chuan Lu. Retrieved from https://idiyas.com/inventor/hui-chuan-lu-a0176bkb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Hui-Chuan Lu: Innovator in Display Technology

Introduction

Hui-Chuan Lu is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of display technology, particularly through his innovative methods for manufacturing display substrates. His work has implications for the efficiency and quality of display devices.

Latest Patents

Hui-Chuan Lu holds a patent for a "Method for manufacturing display substrate." This patent outlines a process that includes providing a substrate, forming a plurality of bumps on an active area of the substrate, and creating at least one marking pattern on a non-active area. The method also involves staining the marking pattern or filling a material with a low transmittance ratio into the marking pattern. This invention enhances the manufacturing process of display substrates, making it more efficient and effective.

Career Highlights

Hui-Chuan Lu is associated with Chunghwa Picture Tubes, Ltd., where he has been instrumental in advancing display technology. His expertise and innovative approach have contributed to the company's reputation in the industry.

Collaborations

Hui-Chuan Lu has collaborated with talented coworkers, including Yi-Cheng Tsai and Yui-Chen Liu. Their combined efforts in research and development have led to advancements in display technology.

Conclusion

Hui-Chuan Lu's contributions to the field of display technology through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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