Monroeville, NJ, United States of America

Hui Bin Huang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2018-2025

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4 patents (USPTO):Explore Patents

Title: Innovations by Inventor Hui Bin Huang

Introduction

Hui Bin Huang is a prominent inventor based in Monroeville, NJ, USA. With a total of four patents to her name, she has made significant contributions to the field of polishing technology through her innovative designs and methods. Her work focuses primarily on the development of specialized polishing pads that enhance performance in electronic materials processing.

Latest Patents

Hui Bin Huang's latest inventions include the following patents:

1. **Offset Pore Poromeric Polishing Pad**

This invention introduces a porous polyurethane polishing pad designed with a unique porous matrix. The pad features large pores that extend upward from a base surface to the upper polishing surface, contributing to increased compressibility and contact area during polishing. The innovative structure of the large pores includes offset lower and upper sections, while middle-sized and small columnar pores are strategically placed to enhance performance.

2. **Method of Forming Leveraged Poromeric Polishing Pad**

This patent outlines a method for creating porous polyurethane polishing pads by feeding liquid polyurethane onto a web sheet using a doctor blade. The process includes coagulating the liquid polyurethane to form a two-layer substrate composed of a porous matrix, enhancing the functionality and effectiveness of the polishing pad.

Career Highlights

Hui Bin Huang is currently associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., a leading company in the electronic materials sector. Her work has positioned her as a key innovator within the company, as she continues to push the boundaries of polishing technology.

Collaborations

During her career, Huang has collaborated with esteemed colleagues, including Katsumasa Kawabata and Koichi Yoshida. Their teamwork has likely played a significant role in advancing the development of her patented technologies.

Conclusion

Hui Bin Huang exemplifies the spirit of innovation within the field of polishing technology. Her contributions through her patents demonstrate her commitment to improving the efficiency and effectiveness of electronic materials processing. As she continues her work, the impact of her inventions is expected to resonate throughout the industry.

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