Paris, France

Hugues Bruvier

This inventor holds 1 USPTO granted patent. Top assignee: Societe Miniere Et Metallurgique De Penarroya. Active years: 1985.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hugues Bruvier. Retrieved from https://idiyas.com/inventor/hugues-bruvier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Hugues Bruvier: Innovator in Electrochemical Processes

Introduction

Hugues Bruvier is a notable inventor based in Paris, France. He has made significant contributions to the field of electrochemical processes, particularly in the removal of nickel from lead chloride solutions. His innovative approach addresses environmental concerns associated with metal contamination.

Latest Patents

Hugues Bruvier holds a patent for the "Electrochemical elimination of nickel from lead containing chloride." This invention relates to a process for removing nickel from lead chloride dissolved in chloride brine. The goal is to obtain a lead chloride solution with a nickel concentration below 50 mg/liter. The process involves several steps that enhance the efficiency of nickel removal.

Career Highlights

Hugues Bruvier is associated with Société Minière et Métallurgique de Penarroya, where he applies his expertise in electrochemical processes. His work has contributed to advancements in metallurgy and environmental protection.

Collaborations

Hugues has collaborated with notable colleagues, including Didier Beutier and Claude Palvadeau. Their combined efforts have fostered innovation in their respective fields.

Conclusion

Hugues Bruvier's contributions to electrochemical processes exemplify the importance of innovation in addressing environmental challenges. His work continues to influence the field of metallurgy and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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