Zhubei, Taiwan

Huei Shuan Phoebe Tan

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Polyera Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Huei Shuan Phoebe Tan. Retrieved from https://idiyas.com/inventor/huei-shuan-phoebe-tan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Innovations of Huei Shuan Phoebe Tan

Introduction

Huei Shuan Phoebe Tan is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of electronic materials, particularly through his innovative work on photocurable polymers. His expertise and creativity have led to advancements that are essential for various electronic, optical, and optoelectronic devices.

Latest Patents

Huei Shuan Phoebe Tan holds a patent for "Photocurable polymeric materials and related electronic devices." This patent discloses photocurable polymers that can be utilized as active and/or passive organic materials in a range of electronic applications. The invention includes devices that may feature a dielectric layer or a passivation layer made from these advanced polymers.

Career Highlights

Tan is currently associated with Polyera Corporation, where he continues to develop innovative materials for electronic devices. His work has been instrumental in enhancing the performance and efficiency of electronic components.

Collaborations

He has collaborated with talented individuals such as Hakan Usta and Yu Xia, contributing to a dynamic research environment that fosters innovation and creativity.

Conclusion

Huei Shuan Phoebe Tan's contributions to the field of photocurable polymers exemplify the impact of innovative thinking in technology. His work not only advances electronic materials but also paves the way for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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