This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Dupont Electronic Materials International, LLC. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Huan He: Inventor in Photoresist Materials
Introduction
Huan He is an inventor associated with Hopkinton, Massachusetts, and Dupont Electronic Materials International, LLC. His work includes a patented polymer technology for photoresist compositions and pattern formation.
Latest Patents
The provided information lists one patent for Huan He: “Polymer, Photoresist Compositions Including the Same, and Pattern Formation Methods.” The invention describes a polymer with a first repeating unit containing an acid-labile group, an anionic end group selected from a carboxylate or sulfamate group, and an organic cation. The polymer is intended for use in photoresist compositions and pattern formation methods. He is credited with 1 patent in the supplied data.
Career Highlights
He is associated with Dupont Electronic Materials International, LLC, a company working in electronic materials. The available information identifies his patent contribution but does not provide further details about his role or career history.
Collaborations
Huan He’s listed coworker is Tomas Marangoni. The supplied information does not specify whether Marangoni collaborated with him on the patent.
Conclusion
Huan He’s listed patent focuses on polymer chemistry for photoresist compositions and pattern formation, reflecting his connection to electronic materials innovation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile