Taipei, Taiwan

Huai-Luh Chang

This inventor holds 2 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 2003-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Huai-Luh Chang. Retrieved from https://idiyas.com/inventor/huai-luh-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 6.5

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Chung-Ho, TW (2003)
  • Taipei, TW (2004)

Company Filing History:


Years Active: 2003-2004

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2 patents (USPTO):Explore Patents

Title: Huai-Luh Chang: Innovator in Nanotechnology and Ceramic Substrate Planarization

Introduction

Huai-Luh Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the fields of nanotechnology and electronic devices. With a total of 2 patents, his work focuses on innovative solutions that enhance the performance and manufacturing processes of electronic components.

Latest Patents

Chang's latest patents include groundbreaking inventions that address critical challenges in electronic and opto-electronic devices. One of his notable patents is the "Self-organized nanometer interface structure and its applications in electronic and opto-electronic devices." This invention discloses a self-organized nanometer interface structure formed during the reactive sputtering process. The unique chemical dynamics among reactants induce self-organization, resulting in an interface potential difference that functions like a diode. This technology offers advantages such as a wide variety of material selections, highly compatible processes, easy operations, and low-cost fabrications.

Another significant patent is the "Planarization of ceramic substrates using porous materials." This invention introduces a novel approach to planarizing ceramic substrates by utilizing porous materials. The planarized substrate consists of a ceramic substrate, a buffer layer, and a nanostructure layer. The ceramic substrate provides structural strength, while the buffer layer ensures adhesion between the substrate and the nanostructure layer. The nanostructure layer enhances surface smoothness, making it suitable for thin-film processing techniques and improving adhesion for metallization and electronic materials.

Career Highlights

Huai-Luh Chang is affiliated with the Industrial Technology Research Institute, where he continues to advance research and development in his field. His work has garnered attention for its practical applications and innovative approaches to existing technological challenges.

Collaborations

Chang has collaborated with notable colleagues, including Jong-Hong Lu and Sheng-Ju Liao, who contribute to the dynamic research environment at the Industrial Technology Research Institute.

Conclusion

Huai-Luh Chang's contributions to nanotechnology and ceramic substrate planarization exemplify the innovative spirit of modern inventors. His patents not only advance technology but also pave the way for future developments in electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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