Company Filing History:
Years Active: 2004-2005
Title: Hua Ji - Innovator in Trench Isolation Technology
Introduction
Hua Ji is a notable inventor based in San Jose, CA, with a focus on advancements in semiconductor technology. He holds a total of 3 patents that contribute significantly to the field of trench isolation.
Latest Patents
Hua Ji's latest patents include innovative methods for trench isolation without grooving. One of his key inventions describes a method and structure to form shallow trench isolation regions without trench oxide grooving. This method involves a two-step oxide process where an oxide liner lines the inside surface of a trench, and the trench is filled with a bulk oxide layer, preferably using a high-density plasma chemical vapor deposition (HDP-CVD) process. The oxide liner and the bulk oxide layer are designed to have similar etch rates, ensuring that when etching occurs, a common dielectric top surface is formed that is substantially planar and free of grooves.
Career Highlights
Throughout his career, Hua Ji has worked with prominent companies in the semiconductor industry, including Mosel Vitelic Corporation and Promos Technologies, Inc. His contributions have been instrumental in advancing trench isolation technologies.
Collaborations
Hua Ji has collaborated with several professionals in his field, including Dong Jun Kim and Jin-Ho Kim, enhancing the innovation process through teamwork and shared expertise.
Conclusion
Hua Ji's work in trench isolation technology showcases his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in creating efficient and effective semiconductor structures.