Company Filing History:
Years Active: 2010-2012
Title: Innovations by Inventor Hua Ji
Introduction
Hua Ji is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents, his work focuses on advanced methods for atomic layer deposition.
Latest Patents
Hua Ji's latest patents include an atomic layer deposition method and a semiconductor device formed by the same. The disclosed method involves several steps, including placing a semiconductor substrate in an atomic layer deposition chamber. The process begins with feeding a first precursor gas to the semiconductor substrate to form a first discrete monolayer. An inert purge gas is then used to remove any unreacted precursor gas. Following this, a second precursor gas is introduced to react with the first precursor gas, forming discrete atomic size islands. The method continues with further steps to ensure the formation of a semiconductor device that meets high-performance standards.
Career Highlights
Hua Ji is currently employed at Semiconductor Manufacturing International Corporation in Shanghai. His expertise in atomic layer deposition has positioned him as a key player in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor device manufacturing.
Collaborations
Hua Ji has collaborated with notable colleagues, including Min-Hwa Chi and Fumitake Mieno. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.
Conclusion
Hua Ji's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing processes.