This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Innovations of Hua-Biao Wu in Photomask Technology.
Introduction
Hua-Biao Wu is a notable inventor based in Singapore, recognized for his contributions to photomask technology. His innovative approach has led to advancements in the field, particularly in the design and formation of photomasks used in solid-state image sensors.
Latest Patents
Hua-Biao Wu holds a patent titled "Method of making photomask layout and method of forming photomask including the photomask layout." This patent describes a method for creating a photomask layout that includes a correction step performed on graphic data. The method involves adding a substantially ring-shaped pattern inside a rectangular pattern, enhancing the photomask's functionality.
Career Highlights
Hua-Biao Wu is currently employed at United Microelectronics Corporation, where he applies his expertise in photomask technology. His work has significantly impacted the development of micro-lenses for solid-state image sensors, showcasing his ability to merge theoretical knowledge with practical applications.
Collaborations
Hua-Biao Wu has collaborated with esteemed colleagues such as Jie Zhao and Chia-Ping Chen. Their combined efforts have fostered a productive environment for innovation and research within their field.
Conclusion
Hua-Biao Wu's contributions to photomask technology exemplify the importance of innovation in advancing modern imaging systems. His work continues to influence the industry and inspire future developments in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile