Hsueh-Heng Lin

Title: Hsueh-Heng Lin: Innovator in Semiconductor Technology

Introduction

Hsueh-Heng Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative designs have the potential to enhance the efficiency and reliability of semiconductor structures.

Latest Patents

Hsueh-Heng Lin holds a patent for a "Mandrel fin design for double seal ring." This semiconductor structure includes two circuit regions and two inner seal rings, each surrounding one of the circuit regions. Each inner seal ring features a substantially rectangular periphery with four interior corner stress relief (CSR) structures. Additionally, the structure includes an outer seal ring that surrounds the two inner seal rings. The outer seal ring has a rectangular periphery without CSR structures at its corners. It also incorporates a plurality of first fin structures located between the inner seal rings and the respective short side of the outer seal ring. The lengths of these first fin structures gradually decrease from the inner seal rings to the short side of the outer seal ring.

Career Highlights

Hsueh-Heng Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited. His work focuses on advancing semiconductor technologies and improving design methodologies. His innovative approach has led to the development of unique solutions in the semiconductor industry.

Collaborations

Hsueh-Heng Lin has collaborated with several talented individuals, including Shan-Yu Huang and Shih-Chang Chen. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hsueh-Heng Lin is a prominent figure in the semiconductor industry, known for his innovative designs and contributions. His patent for the mandrel fin design showcases his expertise and commitment to advancing technology. His work continues to influence the field and inspire future innovations.