Hsueh-Chun Wu

Title: Hsueh-Chun Wu: Innovator in Eco-Friendly Inkjet Technology

Hsueh-Chun Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of inkjet technology, particularly with a focus on environmentally-friendly solutions. His innovative approach has led to the development of a unique ink composition that meets both environmental and print quality standards.

Latest Patents

Hsueh-Chun Wu holds a patent for a nano-pigment inkjet ink composition that is characterized by its low odor and environmentally-friendly properties. This composition includes, based on the total weight of the inkjet ink, from 1 to 10 percent by weight of N-ethyl pyrrolidone; from 1 to 20 percent by weight of propylene carbonate; and from 50 to 80 percent by weight of a glycol ether solvent. Additionally, it contains a nano-pigment, a dispersant, a resin, a plasticizer, a surfactant, and from 0.1 to 3.0 percent by weight of an acidity regulator that is at least one cyclic tertiary amine compound. This innovative ink composition not only meets environmental requirements but also ensures high print quality, with features such as good storage stability, inkjet stability, and resistance to clogging of printhead nozzles.

Career Highlights

Hsueh-Chun Wu is currently associated with Jetbest Corporation, where he continues to advance his research and development efforts in ink technology. His work has garnered attention for its potential to revolutionize the inkjet printing industry by providing a sustainable alternative to traditional ink compositions.

Collaborations

Hsueh-Chun Wu collaborates with talented individuals in his field, including Ke-Yung King and Chia-Kuei Ling, who contribute to the innovative projects at Jetbest Corporation.

Conclusion

In summary, Hsueh-Chun Wu is a pioneering inventor whose work in eco-friendly inkjet technology is making a significant impact. His patented innovations reflect a commitment to sustainability and high-quality printing solutions.