New Taipei, Taiwan

Hsuan-Po Huang

This inventor holds 1 USPTO granted patent. Top assignee: Fositek Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsuan-Po Huang. Retrieved from https://idiyas.com/inventor/hsuan-po-huang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hsuan-Po Huang: Innovator in Server Rack Technology

Introduction

Hsuan-Po Huang is a notable inventor based in New Taipei, Taiwan. He has made significant contributions to the field of server rack technology, particularly with his innovative designs that enhance the functionality and efficiency of server installations.

Latest Patents

Hsuan-Po Huang holds 1 patent for a "Retaining device for mounting a slide rail to a server rack." This invention features a retaining device that connects a slide rail to a server rack, incorporating a rear support unit and a front support unit. The design allows for adjustable positioning of the slide rail, ensuring a secure and efficient mounting process.

Career Highlights

Huang is currently employed at Fositek Corporation, where he continues to develop and refine technologies related to server racks. His work has been instrumental in improving the reliability and ease of use of server installations.

Collaborations

Hsuan-Po Huang collaborates with talented colleagues, including Hsu-Hong Yao and Mo-Yu Zhang, who contribute to the innovative environment at Fositek Corporation.

Conclusion

Hsuan-Po Huang's contributions to server rack technology exemplify the spirit of innovation in the tech industry. His patent and ongoing work at Fositek Corporation highlight his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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