Taoyuan, Taiwan

Hsuan-Jung Wu


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022-2024

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2 patents (USPTO):Explore Patents

Title: Hsuan-Jung Wu: Innovator in Digital Isolation Technology

Introduction

Hsuan-Jung Wu is a prominent inventor based in Taoyuan, Taiwan. She has made significant contributions to the field of digital isolation technology, holding a total of 2 patents. Her work focuses on developing advanced electronic circuits that enhance the performance and reliability of digital systems.

Latest Patents

Hsuan-Jung Wu's latest patents include innovative designs for dual circuit digital isolators. The first patent describes an apparatus that features a substrate with an isolator formed over it. This isolator includes a silicon shield layer situated between two buried oxide (BOX) layers. Additionally, it incorporates a silicon layer with an oxide trench structure that defines two silicon islands, each hosting an electronic circuit that is electrically coupled to one another. The second patent also pertains to a dual circuit digital isolator, which consists of a substrate, a coupling capacitor, and an isolator positioned between the substrate and the coupling capacitor. This isolator comprises an MP-well layer, a first well layer, an epi tub layer nested within the MP-well and first well layers, and a second well layer nested in the epi tub layer.

Career Highlights

Hsuan-Jung Wu is currently employed at Allegro Microsystems, LLC, where she continues to push the boundaries of innovation in her field. Her work has been instrumental in developing technologies that improve the efficiency and safety of electronic devices.

Collaborations

Hsuan-Jung Wu collaborates with talented professionals in her field, including Sundar Chetlur and Maxim Klebanov. These partnerships enhance her research and development efforts, leading to groundbreaking advancements in digital isolation technology.

Conclusion

Hsuan-Jung Wu is a remarkable inventor whose contributions to digital isolation technology are noteworthy. Her patents reflect her commitment to innovation and excellence in the field. As she continues her work at Allegro Microsystems, her impact on the industry is sure to grow.

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