Hsinchu, Taiwan

Hsiu-Yuan Fan

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):

Title: Hsiu-Yuan Fan: Innovator in Camera Image Conversion Technology

Introduction: Hsiu-Yuan Fan, an accomplished inventor based in Hsinchu, Taiwan, has made significant strides in the field of image processing. With a focus on enhancing the efficiency of camera image conversion, Fan's work has the potential to revolutionize the way images are processed in various applications.

Latest Patents: Hsiu-Yuan Fan holds a patent for a camera image conversion method designed to reduce processing time. This innovative method includes several key steps: selecting a set of pixels from a source image, storing these pixels in memory, and determining if any of the pixels require coordinate conversion through a predetermined mapping table. If necessary, it converts the coordinates of the required pixels before removing them from memory. This process significantly speeds up image conversion, making it more efficient for real-time applications.

Career Highlights: Fan is currently affiliated with Weltrend Semiconductor Inc., where he contributes his expertise in semiconductor technology and image processing. His innovative approach not only streamlines image conversion but also exemplifies the cutting-edge research being conducted within his organization.

Collaborations: Within Weltrend Semiconductor Inc., Hsiu-Yuan collaborates with talented colleagues, including Hsuan-Ying Chen and Chun-Ting Lin. Their collaborative efforts drive forward the development of advanced technologies that address the challenges in image processing and other semiconductor applications.

Conclusion: Hsiu-Yuan Fan plays a pivotal role in the evolving landscape of image processing technology. His innovative camera image conversion method exemplifies the ongoing research and development efforts at Weltrend Semiconductor Inc. As he continues to collaborate with his colleagues, the potential for future advancements in semiconductor technology remains promising.

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