This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Industrial Technology Research Institute. Active years: 2006-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006-2013
Title: Hsiu-Fen Lin: Innovator in Superhydrophobic and Photocatalytic Technologies
Introduction
Hsiu-Fen Lin is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the fields of superhydrophobic materials and photocatalytic technologies. With a total of 3 patents to his name, Lin's work is at the forefront of innovation in material science.
Latest Patents
One of Lin's latest patents is titled "Superhydrophobic and self-cleaning powders having micron-scale diameter and nano-scale surface roughness and fabrication method thereof." This invention discloses nano/micron binary structured powders designed for superhydrophobic and self-cleaning applications. The powders feature a micron-scale diameter and nano-scale surface roughness, with an average diameter ranging from about 1-25 µm and an average roughness of 3-100 nm. The materials used for these powders may include silica, metal oxide, or combinations thereof.
Another notable patent is "Nanostructured zinc oxide photocatalyst for visible light and manufacturing method of the same." This patent describes a powdered photocatalyst and its manufacturing method, which utilizes a non-transferred DC plasma apparatus in a nitrogen atmosphere at around 1 atm. The process involves vaporizing and oxidizing solid Zn precursors in nitrogen plasma, resulting in tetrapod-shaped and nitrogen-doped photocatalytic ZnO nanopowders with a wurtzite structure.
Career Highlights
Hsiu-Fen Lin is affiliated with the Industrial Technology Research Institute, where he continues to advance his research and development efforts. His innovative work has garnered attention in the scientific community and has potential applications in various industries.
Collaborations
Lin collaborates with several esteemed colleagues, including Shih-Chieh Liao and Song-Wein Hong, who contribute to his research endeavors.
Conclusion
Hsiu-Fen Lin's contributions to superhydrophobic and photocatalytic technologies highlight his role as a leading inventor in material science. His innovative patents reflect a commitment to advancing technology for practical applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile