Company Filing History:
Years Active: 2021-2022
Title: Hsiu-Fang Lo: Innovator in Diode Technology
Introduction
Hsiu-Fang Lo is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in diode structures and manufacturing methods. With a total of 2 patents, his work has advanced the understanding and application of diodes in various electronic devices.
Latest Patents
Hsiu-Fang Lo's latest patents include innovative designs and methods for diode structures. The first patent focuses on a diode structure that comprises a semiconductor substrate, a first semiconductor layer, a second semiconductor layer, and an epitaxy layer. This design allows for improved performance by ensuring that the semiconductor types of the first and second layers are opposite to that of the substrate. The second patent details a transient-voltage-suppression diode structure, which includes a substrate, an N− type epitaxial layer, and multiple implant layers. This structure is designed to enhance the reliability of electronic components by effectively managing voltage transients.
Career Highlights
Hsiu-Fang Lo is currently associated with Mosel Vitelic Corporation, where he continues to innovate in the semiconductor field. His expertise in diode technology has positioned him as a key player in the industry, contributing to advancements that benefit various electronic applications.
Collaborations
Hsiu-Fang Lo collaborates with Yu-Hsuan Chang, a talented coworker who brings her own expertise to their projects. Together, they work on developing cutting-edge technologies that push the boundaries of semiconductor applications.
Conclusion
Hsiu-Fang Lo's contributions to diode technology through his patents and collaborations highlight his role as an influential inventor in the semiconductor industry. His work continues to pave the way for advancements in electronic devices.