Company Filing History:
Years Active: 2004
Title: Hsio-Lei Wang: Innovator in Semiconductor Technology
Introduction
Hsio-Lei Wang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Hsio-Lei Wang holds a patent titled "Method of buried strap out-diffusion formation by gas phase doping." This patent describes a method for forming a buried strap through a series of precise steps. The process begins with providing a substrate that has a pad oxide layer. A masking layer is then formed over this pad oxide layer. The subsequent etching of the masking layer, pad oxide layer, and substrate creates a trench within the substrate. This trench features an outer sidewall and an upper portion, which is lined with a collar. A poly plate is formed within the trench, and both the poly plate and collar are etched below the substrate to create a recessed poly plate and collar, exposing part of the trench's outer sidewall. Ions are implanted into the substrate through the exposed outer sidewall by gas phase doping. Finally, a SiN sidewall layer is formed over the exposed outer sidewall at a temperature that allows the implanted ions to diffuse further into the substrate, resulting in the formation of the buried strap.
Career Highlights
Hsio-Lei Wang is currently employed at Promos Technologies, Inc., where he continues to innovate in the semiconductor industry. His expertise and dedication to research and development have positioned him as a valuable asset to his company.
Collaborations
Hsio-Lei Wang collaborates with talented colleagues, including Jesse Chung and Hung-Kwei Liao. Their combined efforts contribute to advancements in semiconductor technologies and foster a collaborative environment for innovation.
Conclusion
Hsio-Lei Wang's contributions to semiconductor technology through his patent demonstrate his commitment to innovation and excellence in the field. His work continues to influence the industry and pave the way for future advancements.