Hsing-Yu Wang

Title: Innovations by Hsing-Yu Wang

Introduction

Hsing-Yu Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of micro-electromechanical systems (MEMS) and semiconductor manufacturing. With a total of 3 patents to his name, Wang's work focuses on improving manufacturing processes and enhancing the quality of MEMS structures.

Latest Patents

Wang's latest patents include innovative methods that streamline the manufacturing process. One of his patents, titled "Extended acid etch for oxide removal," describes a preclean process that may be omitted from a eutectic bonding sequence. This method allows for the removal of oxide from device wafer surfaces without the need for a preceding preclean process. By increasing the duration of the acid-based etch process, the complexity and cycle time of the eutectic bonding sequence are reduced, which ultimately enhances process yield.

Another significant patent is "Methods and systems for improving fusion bonding." This invention involves performing plasma treatment on a substrate before fusion bonding, which leaves residual charge on the substrate. The method includes measuring the residual voltage on a test silicon wafer to ensure the quality of fusion bonds between substrates. If the residual voltage is too high, it indicates that the silicone cushion used for charge dissipation needs replacement, thus maintaining the quality of the bonding process.

Career Highlights

Hsing-Yu Wang is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His work at this leading semiconductor manufacturer has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry.

Collaborations

Wang has collaborated with notable colleagues, including Tzu-Ping Yang and I-Shi Wang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Hsing-Yu Wang's contributions to the field of MEMS and semiconductor manufacturing are noteworthy. His innovative patents reflect a commitment to improving manufacturing processes and enhancing product quality. Wang's work continues to influence the industry positively.