Taoyuan, Taiwan

Hsin-Ying Lu

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Everlight Chemical Industrial Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsin-Ying Lu. Retrieved from https://idiyas.com/inventor/hsin-ying-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Hsin-Ying Lu: Innovator in Polyurethane Derivatives

Introduction

Hsin-Ying Lu is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of polyurethane chemistry. His work focuses on developing innovative materials that enhance the properties of existing compounds.

Latest Patents

Hsin-Ying Lu holds a patent for "Polyurethane derivatives, composition thereof and dye additives comprising the polyurethane derivatives." This invention presents a polyurethane derivative with a specific structure that can be utilized to increase light fastness in various applications. The patent highlights the potential of these derivatives in improving the durability and longevity of materials exposed to light.

Career Highlights

Hsin-Ying Lu is associated with Everlight Chemical Industrial Corporation, where he applies his expertise in polymer chemistry. His role at the company allows him to engage in research and development, contributing to advancements in chemical products.

Collaborations

Hsin-Ying Lu has collaborated with notable colleagues, including Tzu-Heng Ko and Hsiang-Lin Chiang. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Hsin-Ying Lu's work in polyurethane derivatives exemplifies the impact of innovative thinking in the chemical industry. His contributions not only advance material science but also pave the way for future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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