Hsin-Fang Lei

Title: Hsin-Fang Lei: Innovator in Gas Sensor Technology

Introduction

Hsin-Fang Lei is a notable inventor based in Chung-Li, Taiwan. He has made significant contributions to the field of gas sensor technology, particularly through his innovative patent. His work focuses on enhancing the performance and efficiency of gas sensors, which are crucial in various applications.

Latest Patents

Hsin-Fang Lei holds a patent for a substrate structure of a monolithic gas sensor. This patent describes a substrate structure that is designed as a thermal resistant and insulating suspended thin plate configuration on a single crystal silicon substrate. The thin plate features a heating resistor and is coated with a tin-oxide-based reducing gas-sensitive material. The design includes a native silicon oxide layer, a silicon-rich silicon nitride layer, and a top silicon oxide layer, which together form an oxide-nitride-oxide composite configuration. This innovative structure alleviates mechanical stresses within the thin plate, enhancing its durability and performance.

Career Highlights

Hsin-Fang Lei is associated with Opto Tech Corporation, where he continues to develop advanced technologies in the field of gas sensors. His work has led to improved thermal and mechanical stress characteristics, lower electrical power consumption, and cost-effective manufacturing processes.

Collaborations

Hsin-Fang Lei collaborates with Jin-Shown Shie, contributing to the advancement of gas sensor technologies through their combined expertise.

Conclusion

Hsin-Fang Lei's contributions to gas sensor technology exemplify innovation and dedication to improving sensor performance. His patent reflects a significant advancement in the field, showcasing his role as a leading inventor in this area.