Hsin-Chang Li

Title: Hsin-Chang Li: Innovator in Photomask Technology

Introduction

Hsin-Chang Li is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of photomask technology. His innovative approaches have led to advancements that enhance the efficiency and quality of semiconductor production.

Latest Patents

Hsin-Chang Li holds a patent for a "Chrome mask dry etching process to reduce loading effect and defects." This method describes a technique for forming photomasks that ensures good critical dimension control for essential pattern elements. The process involves modifying the pattern to create a frame around the elements requiring precise control. The opaque material, such as chrome, is etched away using dry anisotropic etching, which provides excellent critical dimension control. Subsequently, wet isotropic etching is employed to remove the remaining opaque material, ensuring good defect control and throughput. This innovative method effectively balances critical dimension control, throughput in mask fabrication, and defect level management.

Career Highlights

Hsin-Chang Li is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has been instrumental in developing processes that improve the quality and efficiency of photomask production. His expertise in etching processes has positioned him as a valuable asset in the field.

Collaborations

Hsin-Chang Li has collaborated with notable colleagues, including San-De Tzu and Sheng-Chi Chin. These collaborations have fostered an environment of innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

Hsin-Chang Li's contributions to photomask technology and semiconductor manufacturing are noteworthy. His innovative patent and collaborative efforts highlight his commitment to advancing the industry. His work continues to influence the field, ensuring better quality and efficiency in semiconductor production.