Hsien Wen Su

Title: Hsien Wen Su: Innovator in Semiconductor Technology

Introduction

Hsien Wen Su is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of shallow trench isolation fabrication. His innovative methods have paved the way for advancements in semiconductor manufacturing processes.

Latest Patents

Hsien Wen Su holds a patent for a "Method for shallow trench isolation fabrication and partial oxide layer removal." This method involves forming a thoroughly deposited shallow trench isolation. A first oxide layer is conformally formed over the surface of a semiconductor substrate and on a trench with an aspect ratio greater than 3. A liquid etching shield is filled in the trench by spin-spraying to cover the oxide layer in the trench. An etchant is then sprayed over the surface of the semiconductor substrate to remove the uncovered oxide layer and expose the surface of the semiconductor substrate. The density of the etchant is less than that of the liquid etching shield. Finally, a second oxide layer is deposited in the trench to form isolation without voids or seams. This patent showcases his expertise and innovative approach to semiconductor fabrication.

Career Highlights

Hsien Wen Su is currently employed at Nan Ya Technology Corporation, where he continues to work on cutting-edge semiconductor technologies. His role at the company allows him to apply his knowledge and skills in a practical setting, contributing to the advancement of the industry.

Collaborations

Hsien Wen Su has collaborated with notable colleagues, including Pei-Ing Paul Lee and Chang Rong Wu. These collaborations have likely enhanced his work and contributed to the success of various projects within the semiconductor field.

Conclusion

Hsien Wen Su is a distinguished inventor whose work in semiconductor technology has led to innovative methods that improve fabrication processes. His contributions are vital to the ongoing advancements in the industry, and his patent reflects his commitment to innovation.