This inventor holds 1 USPTO granted patent. Top assignee: National Tsing Hua University. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Hsien-Te Tseng: Innovator in Charge Storage Technology
Introduction
Hsien-Te Tseng is a notable inventor based in Toucheng, Taiwan. He has made significant contributions to the field of charge storage technology. His innovative approach has led to advancements that enhance the efficiency of charge storage apparatuses.
Latest Patents
Hsien-Te Tseng holds a patent titled "Method to deposit particles on charge storage apparatus with charge patterns and forming method for charge patterns." This invention discloses a method to deposit particles on a charge storage apparatus with charge patterns. The forming method includes providing a charge storage apparatus that has an electrically conducting substrate and a charge storage media layer. The apparatus is disposed in a vacuum or an anhydrous environment. An electrode and the electrically conducting substrate are utilized to conduct a first voltage and a second voltage respectively to form an electric field. Charges are then stored into the charge storage media layer of the charge storage apparatus through the electric field, and the charge patterns are formed. Consequently, particles are deposited on the charge pattern-defined areas. Hsien-Te Tseng has 1 patent to his name.
Career Highlights
Hsien-Te Tseng is affiliated with National Tsing Hua University, where he continues to engage in research and development in his field. His work has been instrumental in pushing the boundaries of charge storage technology.
Collaborations
Hsien-Te Tseng has collaborated with Shangjr Gwo, contributing to advancements in their shared field of expertise.
Conclusion
Hsien-Te Tseng's innovative work in charge storage technology exemplifies the impact of dedicated research and development. His contributions continue to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile