Hsien Kuang Lin

Title: Hsien Kuang Lin: Innovator in Photosensitive Compositions

Introduction

Hsien Kuang Lin is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of photosensitive compositions, particularly through his innovative processes.

Latest Patents

Hsien Kuang Lin holds a patent for a "Process for preparing water dispersible negative-type photosensitive compositions." This invention outlines a method that includes several steps: adding an unsaturated photomonomer and/or a plasticizer to a carboxyl-group bearing acrylic resin solution containing an organic solvent, distilling and removing the organic solvent to form a resin paste, dissolving a photoinitiator and an alkaline into the resin paste, adding deionized water and mixing thoroughly to form an emulsion, and finally adjusting the viscosity of the emulsion with a water-soluble resin. He has 1 patent to his name.

Career Highlights

Hsien Kuang Lin is associated with the Industrial Technology Research Institute, where he has been involved in various research and development projects. His work focuses on enhancing the efficiency and effectiveness of photosensitive materials.

Collaborations

Hsien Kuang Lin collaborates with Jauder Jeng, contributing to advancements in their field through shared expertise and innovative ideas.

Conclusion

Hsien Kuang Lin's contributions to the development of water-dispersible photosensitive compositions highlight his role as an important inventor in the field. His innovative processes continue to influence the industry and pave the way for future advancements.