Taipei, Taiwan

Hsien-Chin Liu

This inventor holds 1 USPTO granted patent. Top assignee: U-Tech Media Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsien-Chin Liu. Retrieved from https://idiyas.com/inventor/hsien-chin-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Hsien-Chin Liu: Innovator in Optical Recording Media

Introduction

Hsien-Chin Liu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of optical recording media, particularly through his innovative patent.

Latest Patents

Hsien-Chin Liu holds a patent for a "Scratch-off material layer applied on optical recording media." This invention features an optical recording medium that includes a transparent substrate, a reflective layer formed on the transparent substrate, a protective layer formed on the reflective layer, and information formed on a surface of the protective layer. Additionally, it incorporates at least one opaque scratch-off material layer formed on the protective layer to disguise the information. This patent showcases Liu's creativity and technical expertise in enhancing optical media.

Career Highlights

Liu is associated with U-Tech Media Corporation, where he has been instrumental in developing advanced technologies in optical recording. His work has contributed to the company's reputation as a leader in the media technology sector.

Collaborations

Hsien-Chin Liu has collaborated with talented individuals such as Hung-Hsum Huang and Irene Chen. These partnerships have fostered innovation and creativity within their projects.

Conclusion

Hsien-Chin Liu's contributions to optical recording media through his patent demonstrate his innovative spirit and technical prowess. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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