Hsinchu, Taiwan

Hsien-Chen Ma

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Industrial Technology Research Institute. Active years: 2014.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Hsien-Chen Ma: Innovator in Material Aging Technology

Introduction

Hsien-Chen Ma is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of material aging technology. His innovative approach has led to the development of a unique aging apparatus that enhances the understanding of material properties over time.

Latest Patents

Hsien-Chen Ma holds a patent for a "Material Aging Apparatus." This apparatus includes a pulse laser, a beam expansion assembly, and a platform designed to carry an object. The pulse laser transmits a first beam to the beam expansion assembly, which then expands the first beam into a second beam and projects it onto the object. This invention is crucial for studying the aging processes of various materials.

Career Highlights

Hsien-Chen Ma is affiliated with the Industrial Technology Research Institute, a leading research organization in Taiwan. His work at this institute has allowed him to focus on advancing technology and innovation in material science. His dedication to research and development has positioned him as a key figure in his field.

Collaborations

Hsien-Chen Ma has collaborated with notable colleagues, including Yu-Tai Li and Yu-Hsien Lee. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hsien-Chen Ma's contributions to material aging technology exemplify the spirit of innovation. His patent and work at the Industrial Technology Research Institute highlight his commitment to advancing scientific knowledge. His collaborations further enhance the impact of his research in the field.

Profile summary based on public USPTO records.
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