Hsiao-Yi Shih

Title: Hsiao-Yi Shih: Innovator in Photoinitiator Sensitization

Introduction

Hsiao-Yi Shih is a notable inventor based in Whippany, NJ (US). He has made significant contributions to the field of photoinitiator sensitization, holding a total of 4 patents. His work focuses on enhancing the sensitivity of film bases, particularly in relation to long wavelength UV light.

Latest Patents

One of Hsiao-Yi Shih's latest patents involves a diacetylene film sensitized with photoinitiators. This innovative process improves the sensitivity of a film base coated with a dispersion of a normally crystalline polyacetylenic compound in a non-solvating liquid. The film is specifically designed to respond to particular photon energy bands, especially long wavelength UV. The polyacetylenic compound used in this process contains at least two conjugated acetylenic linkages and ranges from 12 to 60 carbon atoms. The sensitization is achieved by adding photoinitiators that absorb UV energy and convert it into free radicals. The resulting dispersion is coated and dried on a substrate, leading to applications such as UVA illumination indicators and dosimeters.

Career Highlights

Hsiao-Yi Shih is currently associated with Isp Investments Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the understanding and application of photoinitiators in various fields.

Collaborations

Hsiao-Yi Shih has collaborated with notable colleagues, including Xiang Y Yu and David F Lewis. Their combined expertise has contributed to the successful development of innovative solutions in their respective fields.

Conclusion

Hsiao-Yi Shih is a prominent inventor whose work in photoinitiator sensitization has led to significant advancements in film technology. His contributions continue to impact various applications, showcasing the importance of innovation in the field.