Tainan City, Taiwan

Hsiao-Fu Lu

This inventor holds 1 USPTO granted patent. Top assignee: Mikro Mesa Technology Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hsiao-Fu Lu. Retrieved from https://idiyas.com/inventor/hsiao-fu-lu-l9v2ltgn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hsiao-Fu Lu: Microdevice Manufacturing Inventor

Introduction

Hsiao-Fu Lu is an inventor based in Tainan City, Taiwan. His work includes a patented method for manufacturing microdevices, and he is associated with Mikro Mesa Technology Co., Ltd.

Latest Patents

Lu is credited with 1 patent, titled “Method of Manufacturing Micro Devices.” The method describes preparing a III-nitride epitaxial structure with p-type and n-type layers, an AlIII_othersN layer, and an undoped III-nitride layer. A patterned photoresist layer guides a first plasma etching process that forms a trench. A second plasma etching process then separates the structure into multiple microdevices and exposes the top surface of the etched AlIII_othersN layer.

Career Highlights

Lu’s patent focuses on plasma etching and the fabrication of microdevices from III-nitride epitaxial structures. The disclosed process uses sequential etching steps to shape and separate the devices.

Collaborations

Lu is associated with Mikro Mesa Technology Co., Ltd. The available information identifies this company connection but does not specify particular collaborators or joint projects.

Conclusion

Hsiao-Fu Lu’s patent documents a specialized approach to manufacturing microdevices through sequential plasma etching of a III-nitride structure.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…